INFICON 殘餘氣體分析儀 ( RGA )

殘餘氣體分析儀(RGA)殘餘氣體分析儀(Residual Gas Analyzer ; RGA)被應用於真空領域已超過三十多年是,業界與學界用來了解真空系統內氣體分布的變化與含量,廣泛應用於真空系統測漏、製程氣體分析、氣體濃度分析等目的。近年來RGA已逐漸與各半導體製程設備相結合,其角色也已轉變成屬於生產線設備之一環。

市面上可見的RGA,皆屬於使用四極管作正離子篩選的質譜儀。它主要包括了偵測頭(Sensor)、電子控制箱(Electronic Box)與控制顯示器(PC)。在偵測頭(Sensor)部分又包含了三個主要元件,分別是離子源( Ion Source)、四極管( Quadrupole Mass Filter) 及離子電流偵測器(Ion Current Detector)。

操作原理是將真空室內所有氣體分子,透過離子源(Ion Source)內的燈絲(Filament)將氣體離子化,並將產生的正離子導進四極管內。進入四極管內的正離子,因四極管( Quadrupole Mass Filter)本身以直流及交流電位互相交錯而產生的共振電場,對具有不同質荷比(mass-to-charge ratio) 的正離子進行篩選。具有相同共振現象的離子以穩定螺旋軌跡通過篩選以進入離子電流偵測器(Ion Current Detector),此時偵測器就能偵測到該質荷比的離子訊號,進而透過軟體換算成氣體分壓。

我們提供INFICON英福康各式RGA之銷售,系統設計及技術諮詢。如您需要更清楚詳細的殘餘氣體分析儀(RGA)產品資訊或規劃,煩請隨時與我們聯絡,我們會提供您迅速滿意資訊及服務。

Sion射頻檢測器

非侵入式鉗式射頻檢測器可在 iPVD、PECVD 和蝕刻中實現高速弧檢測降低晶片損失、提高產量等,離子過程中的電弧放電可造成靶材和腔室損壞,從而導致基片受損並產生顆粒。隨著特徵尺寸的下降,微電子設備越來越容易出現電弧引發的損壞。電弧放電可出現在任何等離子輔助過程中,例如電離物理氣相沉積 (iPVD)、等離子增強化學氣相沉積 (PECVD) 和蝕刻。INFICON Sion 弧檢測器可提供至關重要的第一道防線。Sion 能夠快速檢測到微弧並在明顯損傷或廢料出現之前與其反應。系統可對等離子微電弧事件進行即時檢測和分析。

FabGuard FDC

Fabwide, Process Specific

FabGuard FDC combines on-line Fault Detection and Classification (FDC) capabilities with powerful tools for fab engineers to readily analyze virtually any aspect of process and equipment behavior. No other system provides greater capability to guard against wafer loss, reduce unscheduled tool downtime and improve yield.

Regardless of wafer size or product geometry, timely information is key to fab productivity and competitiveness. The increasing pressure to reduce costs makes it critical to maximize fab productivity, reduce the number of scrapped wafers and maximize equipment utilization. FabGuard meets the challenges of today’s semiconductor manufacturing by combining the collective experience of statisticians and engineers tasked with maintaining cutting edge fab productivity. FabGuard FDC is built on the principle that process and equipment knowledge is crucial to smooth fab operations.

Redefining FDC - FabGuard Detection and Classification

FabGuard FDC enables FDC engineering at all levels ranging from detailed hands-on chamber specific knowledge to fab-wide statistical process control.

FabGuard is the only system that combines the sweeping functionality of fab-wide FDC systems together with tool specific data analysis capabilities for process engineering and equipment troubleshooting. Established fab Statistical Process Control (SPC) methods can be easily programmed into FabGuard with the added advantage of real-time tool interdiction. Wafer scrap is dramatically reduced when tool interdiction is applied as soon as a fault is detected. FabGuard reacts instantaneously to stop problem tools when an out of control condition is detected.

FabGuard FDC Expert System Learns Your Process and Recognizes Problems

SPC rules are frequently employed as a first line of defense to prevent product loss. FabGuard offers an additional level of protection - a trainable Expert System. Fab engineers can train FabGuard to recognize new problems as they appear and automatically detect them when they occur again. The problem solving know-how of fab engineers can be easily translated into FabGuard recipes that monitor any process step on any chamber on any tool. Running in parallel with SPC-based tool interdiction, FabGuard Expert System capability allows process and equipment engineers to train FabGuard to recognize problems that SPC methods may not detect. FabGuard Expert Systems allow engineering know-how to be programmed into FabGuard for an added level of wafer protection and fault identification.

Fabwide Protection

The FabGuard FDC system is deployable and sustainable at the factory level for real-time Statistical Process Control (SPC) on all wafer process equipment. A single user interface allows engineers to sort, display and analyze tool and process data with extreme flexibility and ease.

  • Fab engineers are provided with powerful tool-based data visualization and the ability to analyze all aspects of equipment and process behavior.
  • Process engineers can readily determine relationships between equipment state and wafer outcome.
  • Equipment engineers can quickly diagnose tool problems to reduce unscheduled downtime. Process chambers can be compared and matched.

Tool, Sensor and Gauge Integration

Collecting the right data at the right time is critical to detecting excursions and characterizing processes. Along with FDC analysis and excursion monitoring, FabGuard acts as an integration platform to allow engineers to collect data from a wide range of alternative data sources. The FabGuard architecture allows for easy integration of new sensors and gauges.

  • SECS
  • OPC
  • High-Speed Analog
  • INFICON Sensors (RGA, OES, RF/DC Arc Detection)
  • 3rd Party Sensors and Gauges

Scaleability, Sustainability

Data is archived and analysis results are stored in a relational database. FabGuard supports Microsoft®SQL, PostgreSQL or Oracle® databases. Hardware redundancy is eliminated through a tool-based system that is easily scalable from one tool to several hundred tools across an entire fab. FDC engineers can sort through and view all information through a single, easy-to-use, web-based interface. The consistent format throughout the fab improves the learning curve and facilitates the sharing of information among different process and equipment groups. Alarming, reporting and tool interdiction can be configured to the specific needs of user groups and equipment circumstances. INFICON has drawn upon its experience in leading fabs worldwide to create system templates that pay for themselves as quickly as they are deployed.

The unique combination of real-time SPC and expert systems capabilities make FabGuard FDC the most powerful system available for detecting problems to prevent wafer loss and reduce unscheduled equipment downtime.